We maintain a wide variety of facilities for synthesis and analysis of photonic and electronic materials and devices. Group equipment ranges from thin film deposition to optical and electrical characterization.

Synthesis:

Group IV Molecular Beam Epitaxy
Oxide Molecular Beam Epitaxy
UHV Sputtering System
UHV Hot Wire CVD Cluster Tool
Metal Evaporator
II-VI Semiconductor Nanocrystal Wet Prep Facility
300mm Ultraclean Aerosol Nanoparticle Synthesis Facility
Wafer Bonding System
UV Ozone Cleaning System
Optical Photolithography Facility
Plasma Asher
Rapid Thermal Annealing Facility

Characterization:

Auger/XPS/SIMS Facility
Scanning Electron Microscopy
Transmission Electron Microscopy
Ambient Atomic Force / Electrostatic Force Microscopy (Park Scientific)
UHV Variable Temperature Atomic Force / Electrostatic Force Microscopy (Omicron Instruments)
Near Field Scanning Optical Microscopy (WiTeC and Nanonics)
Spectroscopic Ellipsometry
Fourier Transform Infrared Spectroscopy
Visible Spectroscopy Facilities (CCD, PMT)
Diode, Argon, Excimer Laser Sources
Tunable Arc Lamp/Monochromator Source
Tunable Dye Laser Source