Ammonia pretreatment for high-k dielectric growth on silicon
Appl. Phys. Lett. 85, 3830 (2004); DOI:10.1063/1.1807024
Rhett Brewer
Research
I am currently working with Intel Corporation in pathfinding for the next generation of NAND flash cells. My expertise is in high-k dielectric properties and cell electrical characterization. While the specifics of this research would be interesting to discuss, it is also proprietary.
My Ph.D. research was focused on growing pseudo-single crystalline films on amorphous layers and monitoring the growth using electron scattering.
My post-doctoral research was focused on atomic layer deposition of high-k dielectrics on silicon and monitoring the surface reactions with in-situ infrared spectroscopy.
Representative papers and thesis links:
Rapid biaxial texture development during nucleation of MgO thin films during ion beam-assisted deposition Applied Physics Letters (2002)